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Pattern dependencies in the plasma etching of polysilicon

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Pattern dependencies in the plasma etching of polysilicon

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Author: Dalton, Timothy Joseph
Department: Massachusetts Institute of Technology. Dept. of Chemical Engineering
Publisher: Massachusetts Institute of Technology
Date Issued: 1994
Description:
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1994.Includes bibliographical references (p. 423-441).
URI: http://hdl.handle.net/1721.1/11655
Keywords: Chemical Engineering

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