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Pattern dependencies in the plasma etching of polysilicon

dc.contributor.advisorHerbert H. Sawin.en_US
dc.contributor.authorDalton, Timothy Josephen_US
dc.date.accessioned2005-08-16T23:22:42Z
dc.date.available2005-08-16T23:22:42Z
dc.date.copyright1994en_US
dc.date.issued1994en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/11655
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1994.en_US
dc.descriptionIncludes bibliographical references (p. 423-441).en_US
dc.description.statementofresponsibilityby Timothy Joseph Dalton.en_US
dc.format.extent687 p.en_US
dc.format.extent33570662 bytes
dc.format.extent33570418 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectChemical Engineeringen_US
dc.titlePattern dependencies in the plasma etching of polysiliconen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.identifier.oclc32148397en_US


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