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Fabrication of large-area 100 nm-period gratings using achromatic holographic lithography

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dc.contributor.advisor Henry I. Smith. en_US
dc.contributor.author Yen, Anthony en_US
dc.date.accessioned 2005-08-15T16:00:41Z
dc.date.available 2005-08-15T16:00:41Z
dc.date.copyright 1991 en_US
dc.date.issued 1992 en_US
dc.identifier.uri http://hdl.handle.net/1721.1/13078
dc.description Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1992. en_US
dc.description Includes bibliographical references (leaves 79-87). en_US
dc.description.statementofresponsibility by Anthony Yen. en_US
dc.format.extent 100 leaves en_US
dc.format.extent 5924676 bytes
dc.format.extent 5924434 bytes
dc.format.mimetype application/pdf
dc.format.mimetype application/pdf
dc.language.iso eng en_US
dc.publisher Massachusetts Institute of Technology en_US
dc.rights M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. en_US
dc.rights.uri http://dspace.mit.edu/handle/1721.1/7582
dc.subject Electrical Engineering and Computer Science en_US
dc.title Fabrication of large-area 100 nm-period gratings using achromatic holographic lithography en_US
dc.type Thesis en_US
dc.description.degree Ph.D. en_US
dc.contributor.department Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science en_US
dc.identifier.oclc 26329656 en_US


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