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Surface kinetics modeling of silicon oxide etching in fluorocarbon plasmas
(Massachusetts Institute of Technology, 2004)
Fluorocarbon plasma for silicon oxide etching is a complicated system involving many ion and neutral species. Depending on the plasma condition, many difficulties arise such as RIE lag, etch stop, and low selectivity to ...
Systematic analysis of the crystal structure, chemical ordering, and microstructure of Ni-Mn-Ga ferromagnetic shape memory alloys
(Massachusetts Institute of Technology, 2005)
Ni-n-Ga based ferromagnetic shape-memory alloys (FSMAs) have shown great promise as an active material that yields a large output strain over a range of actuation frequencies. The maximum strain has been reported to be 6% ...
A spectroscopic and electrochemical study of chlorotitanates in molten salt media
(Massachusetts Institute of Technology, 2000)
Ultra-high purity titanium is used as a barrier metal in integrated circuitry. Metallothermic reduction does not produce titanium sufficiently pure for micro-electronics applications so electro refining of the metal in a ...
Atomistic calculations of rate of long-timescale microstructural evolution
(Massachusetts Institute of Technology, 2009)
The ability to investigate materials systems at the resolution of individual atoms makes computational simulations a powerful tool for the study of materials phenomena. However, microstructural evolution in complex materials ...