Login

Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2

Show full item record




Title: Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2
Author: Gray, David Charles
Advisor: Herbert H. Sawin.
Department: Massachusetts Institute of Technology. Dept. of Chemical Engineering
Publisher: Massachusetts Institute of Technology
Issue Date: 1992
Description: Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.Includes bibliographical references (p. 376-384).
URI: http://hdl.handle.net/1721.1/13187
Keywords: Chemical Engineering

Files in this item

Files Size Format View Description
Preview, non-printable (open to all) 32.34Mb PDF View/Open Preview, non-printable (open to all)
Full printable version (MIT only) 32.34Mb PDF View/Open Full printable version (MIT only)

This item appears in the following Collection(s)

Show full item record

Search DSpace@MIT


Advanced Search

Browse

My Account

Links