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The effect of low energy ion bombardment on the crystallographic orientation of thin films

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The effect of low energy ion bombardment on the crystallographic orientation of thin films

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Author: Yu, Lock See
Other Contributors: Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
Advisor: L. Rafael Reif.
Department: Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
Publisher: Massachusetts Institute of Technology
Date Issued: 1985
Description:
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1985.MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE.Includes bibliographical references.
URI: http://hdl.handle.net/1721.1/15310
Keywords: Materials Science and Engineering.

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