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Multiscale modeling of chemical vapor deposition and plasma etching

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Multiscale modeling of chemical vapor deposition and plasma etching

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Author: Rodgers, Seth Thomas, 1970-
Other Contributors: Massachusetts Institute of Technology. Dept. of Chemical Engineering.
Advisor: Klavs F. Jensen.
Department: Massachusetts Institute of Technology. Dept. of Chemical Engineering.
Publisher: Massachusetts Institute of Technology
Date Issued: 2000
Description:
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2000.Includes bibliographical references.
URI: http://hdl.handle.net/1721.1/28219
Keywords: Chemical Engineering.

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