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Feasibility study of spatial-phase-locked focused-ion-beam lithography

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Title: Feasibility study of spatial-phase-locked focused-ion-beam lithography
Author: Yasaka, Anto
Advisor: Henry I. Smith.
Department: Massachusetts Institute of Technology. Dept. of Materials Science and Engineering
Publisher: Massachusetts Institute of Technology
Issue Date: 1995
Description: Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995.Includes bibliographical references (leaves 66-68).
URI: http://hdl.handle.net/1721.1/32663
Keywords: Materials Science and Engineering

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