Yu, Hongpeng; Pey, Kin Leong; Choi, Wee Kiong; Chi, D.Z.; Fitzgerald, Eugene A.; Antoniadis, Dimitri A.
(2007-01)
Continual scaling of the CMOS technology requires thinner gate dielectric to maintain high performance. However, when moving into the sub-45 nm CMOS generation, the traditional poly-Si gate approach cannot effectively ...