| dc.contributor.advisor | Klavs F. Jensen. | en_US |
| dc.contributor.author | Danek, Michal | en_US |
| dc.date.accessioned | 2007-07-18T13:27:45Z | |
| dc.date.available | 2007-07-18T13:27:45Z | |
| dc.date.copyright | 1995 | en_US |
| dc.date.issued | 1995 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/38038 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemistry, 1995. | en_US |
| dc.description | Includes bibliographical references (leaf 184). | en_US |
| dc.description.statementofresponsibility | by Michal Danek. | en_US |
| dc.format.extent | 184 leaves | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Chemistry | en_US |
| dc.title | Chemical approaches to organometallic chemical vapor deposition of wide band-gap II-VI layers and naonocrystal composites | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Chemistry | |
| dc.identifier.oclc | 32598799 | en_US |
