Advanced Search
DSpace@MIT

Deposition and planarization of epitaxial oxide thin films for high temperature superconducting device applications

Research and Teaching Output of the MIT Community

Show simple item record

dc.contributor.advisor Michel J. Cima. en_US
dc.contributor.author Chang, Bertha Pi-Ju en_US
dc.date.accessioned 2007-07-18T13:34:34Z
dc.date.available 2007-07-18T13:34:34Z
dc.date.copyright 1995 en_US
dc.date.issued 1995 en_US
dc.identifier.uri http://hdl.handle.net/1721.1/38087
dc.description Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995. en_US
dc.description Includes bibliographical references (leaves 265-274). en_US
dc.description.statementofresponsibility by Bertha Pi-Ju Chang. en_US
dc.format.extent 274 leaves en_US
dc.language.iso eng en_US
dc.publisher Massachusetts Institute of Technology en_US
dc.rights M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. en_US
dc.rights.uri http://dspace.mit.edu/handle/1721.1/7582
dc.subject Materials Science and Engineering en_US
dc.title Deposition and planarization of epitaxial oxide thin films for high temperature superconducting device applications en_US
dc.type Thesis en_US
dc.description.degree Ph.D. en_US
dc.contributor.department Massachusetts Institute of Technology. Dept. of Materials Science and Engineering en_US
dc.identifier.oclc 33895507 en_US


Files in this item

Name Size Format Description
33895507.pdf 47.42Mb PDF Preview, non-printable (open to all)
33895507-MIT.pdf 47.42Mb PDF Full printable version (MIT only)

This item appears in the following Collection(s)

Show simple item record

MIT-Mirage