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Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films

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Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films

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Author: Hubert, Brian Norio
Department: Massachusetts Institute of Technology. Dept. of Mechanical Engineering
Publisher: Massachusetts Institute of Technology
Date Issued: 1996
Description:
Thesis (S.B. and S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996.Includes bibliographical references (leaves 73-77).
URI: http://hdl.handle.net/1721.1/41025
Keywords: Mechanical Engineering

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