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Hyperthermal molecular beam dry etching of III-V compound semiconductors

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Title: Hyperthermal molecular beam dry etching of III-V compound semiconductors
Author: Hoshino, Isako.
Advisor: Clifton G. Fonstad, Jr.
Department: Massachusetts Institute of Technology. Dept. of Materials Science and Engineering
Publisher: Massachusetts Institute of Technology
Issue Date: 1997
Description: Includes bibliographical references (p. 181-186).Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997.Vita.
URI: http://hdl.handle.net/1721.1/43365
Keywords: Materials Science and Engineering

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