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Variation reduction in a wafer fabrication line through inspection optimization

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dc.contributor.advisor Tom Eagar, Roy Welsch. en_US
dc.contributor.author Bean, John W. (John Wellard) en_US
dc.date.accessioned 2008-11-07T19:41:52Z
dc.date.available 2008-11-07T19:41:52Z
dc.date.copyright 1997 en_US
dc.date.issued 1997 en_US
dc.identifier.uri http://hdl.handle.net/1721.1/43446
dc.description Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997, and Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1997. en_US
dc.description Includes bibliographical references (p. 44). en_US
dc.description.statementofresponsibility by John W. Bean. en_US
dc.format.extent 52 p. en_US
dc.language.iso eng en_US
dc.publisher Massachusetts Institute of Technology en_US
dc.rights M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. en_US
dc.rights.uri http://dspace.mit.edu/handle/1721.1/7582 en_US
dc.subject Materials Science and Engineering en_US
dc.subject Sloan School of Management en_US
dc.title Variation reduction in a wafer fabrication line through inspection optimization en_US
dc.type Thesis en_US
dc.description.degree M.S. en_US
dc.contributor.department Massachusetts Institute of Technology. Dept. of Materials Science and Engineering en_US
dc.contributor.department Sloan School of Management en_US
dc.identifier.oclc 37863465 en_US


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