The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates
Citable URI:
http://hdl.handle.net/1721.1/47650
| Title: | The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates |
| Author: | Stefanik, Todd Stanley, 1973- |
| Other Contributors: | Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. |
| Advisor: | Michael J. Cima. |
| Department: | Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. |
| Publisher: | Massachusetts Institute of Technology |
| Issue Date: | 1996 |
| Description: |
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996. Includes bibliographical references (leaves 108-110). |
| URI: | http://hdl.handle.net/1721.1/47650 |
| Keywords: | Materials Science and Engineering. |
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