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The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates

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The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates

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Author: Stefanik, Todd Stanley, 1973-
Other Contributors: Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
Advisor: Michael J. Cima.
Department: Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
Publisher: Massachusetts Institute of Technology
Date Issued: 1996
Description:
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.Includes bibliographical references (leaves 108-110).
URI: http://hdl.handle.net/1721.1/47650
Keywords: Materials Science and Engineering.

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