Focused Ion Beam Fabrication

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Focused Ion Beam Fabrication

Author: Musil, Christian; Melngailis, John; Stevens, Eugene H.; Bartelt, John; Utlaut, Mark; Post, Richard; Kellog, Edwin; Geiss, Michael W.; Mountain, Robert W.; Shedd, Gordon M.; Lezec, Henri J.; Dubner, Andrew D.; Jacobs, Jarvis B.; Lowther, Rex E.; Mahoney, Leonard J.; Antoniadis, Dimitri A.

Citable URI: http://hdl.handle.net/1721.1/56969

Publisher: Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)

Date Issued: 1986-01

Description:

Contains summary of research program and reports on four research projects.

URI: http://hdl.handle.net/1721.1/56969

Other Identifiers: RLE_PR_128_03

Is Part Of: Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1986
Focused Ion Beam Fabrication

Series/Report no.: Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 128

Keywords: Focused Ion Beam Fabrication, Focused Ion Beam Microsurgery of Integrated Circuits, Ion Beam Assisted Deposition, Fabrication of Graded Channel FET's in GaAs, Fabrication of Graded Channel FET's in Si, Measurement of Beam Profile

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