Chemical Reaction Dynamics at Surfaces
Citable URI:
http://hdl.handle.net/1721.1/57144
| Title: | Chemical Reaction Dynamics at Surfaces |
| Author: | Ceyer, Sylvia T.; Laughlin, Kenneth B.; Li, Yulin; Pullman, David P.; Schulberg, Michelle T.; Cain, Gerald R.; Maynard, Kevin J.; Johnson, Andrew D.; Daley, Sean P. |
| Publisher: | Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT) |
| Issue Date: | 1990-01-01 |
| Description: | Contains reports on two research projects with publication lists in each section. |
| URI: | http://hdl.handle.net/1721.1/57144 |
| Other Identifiers: | RLE_PR_133_01_01s_04 |
| Is Part Of | Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1990 Solid State Physics, Electronics and Optics Materials and Fabrication Chemical Reaction Dynamics at Surfaces |
| Series/Report no.: | Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 133 |
| Keywords: | Chemical Reaction Dynamics at Surfaces, Dynamics of the Reaction of Fluorine with Si(100), Dynamics of the Reaction of Fluorine with Fluorinated Si(100) |
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| Files | Size | Format | View | |
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| RLE_PR_133_01_01s_04.pdf | 384.2Kb |
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