Chemical Reaction Dynamics at Surfaces

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Chemical Reaction Dynamics at Surfaces

Author: Ceyer, Sylvia T.; Li, Yulin; Pullman, David P.; Yang, Julius J.; Cain, Gerald R.; Utz, Arthur L.; Johnson, Andrew D.; Daley, Sean P.; Trautman, Theodore R.

Citable URI: http://hdl.handle.net/1721.1/57195

Publisher: Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)

Date Issued: 1991-01-01

Description:

Contains reports on three research projects.

URI: http://hdl.handle.net/1721.1/57195

Other Identifiers: RLE_PR_134_01_04s_03

Is Part Of: Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1991
Solid State Physics, Electronics and Optics
Surfaces and Interfaces
Chemical Reaction Dynamics at Surfaces

Series/Report no.: Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 134

Keywords: Chemical Reaction Dynamics at Surfaces, Dynamics of the Reaction of F₂ with Si(100), Dynamics of the Reaction of F₂ with Fluorinated Si(100), New Mechanisms for Surface Processes

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