Chemical Reaction Dynamics at Surfaces

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Chemical Reaction Dynamics at Surfaces

Author: Ceyer, Sylvia T.; Li, Yulin; Pullman, David P.; Tsekouras, Athanassios A.; Gosalvez, David B.; Yang, Julius J.; Utz, Arthur L.; Daley, Sean P.; Trautman, Theodore R.

Citable URI: http://hdl.handle.net/1721.1/57237

Publisher: Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)

Date Issued: 1992-01-01

Description:

Contains reports on three research projects.

URI: http://hdl.handle.net/1721.1/57237

Other Identifiers: RLE_PR_135_01_04s_03

Is Part Of: Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1992
Solid State Physics, Electronics and Optics
Surfaces and Interfaces
Chemical Reaction Dynamics at Surfaces

Series/Report no.: Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 135

Keywords: Chemical Reaction Dynamics at Surfaces, New Mechanism for Dissociative Chemisorption on Si, Atom Abstraction, New Mechanisms for Surface Processes, Chemistry of Bulk Hydrogen

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