Nanostructures Technology, Research, and Applications
Author:
Smith, Henry I.; Silverman, Scott E.; Ferrera, Juan; Carter, James M.; Wong, Vincent V.; Gupta, Nitin; Hector, Scott D.; Owen, Gabrielle M.; Schattenburg, Mark L.; Yang, Isabel Y.; Burkhardt, Martin; Li, Huiying; Mondol, Mark K.; Sission, Robert D.; Moon, Euclid E.; Aucoin, Richard J.; Shah, Satyen N.; Yasaka, Anto; Antoniadis, Dimitri A.; Chu, William; Hu, Hang; Rhee, Kee; Su, Lisa T-F.; Carter, David J.; Kumar, Arvind; Melloch, Michael R.; Orlando, Terry P.; del Alamo, Jesús; Eugster, Cristopher C.; Hugunin, James J.; Damask, Jay N.; Haus, Hermann A.; Kolodziejski, Leslie A.; Choi, Woo-Young; Fonstad, Clifton G., Jr.; Moolji, Akbar A.; Lew, Julie C.; Porter, Jeanne M.; Canizares, Claude R.; Fleming, Robert C., Jr.; Donovan, Sean M.; Ismail, Khalid; Thompson, Carl V.
Publisher:
Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)
Date Issued:
1993-01-01
Description:
Contains reports on twenty research projects and a list of publications.
Other Identifiers:
RLE_PR_136_01_02s_04
Is Part Of:
Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1993
Solid State Physics, Electronics and Optics
Quantum-Effect Devices
Nanostructures Technology, Research, and Applications
Series/Report no.:
Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 136
Keywords:
Nanostructures Technology, Nanostructures Research, Nanostructures Applications, NanoStructures Laboratory, Scanning Electron-Beam Lithography Facility, Spatial-Phase-Locked Electron-Beam Lithography, X-Ray Nanolithography, Improved Mask Technology for X-Ray Lithography, High Precision Mask Alignment System, Optimization of Synchrotron-Based X-ray Lithography, Achromatic Holographic Lithography, Ion Beam Lithography, High Performance Self-aligned Sub-100 nm MOSFETs Using X-ray Lithography, Fabrication of T-gate Devices Using X-ray Lithography, Coulomb Charging Effects in Semiconductor Nanostructures, Coulomb Charging Tunneling in Semiconductor Nanostructures, Dual Electron Waveguide Device Fabricated Using X-ray Lithography, Novel Mesoscopic Superconducting Devices, Channel-Dropping Filters Fabricated Using X-ray Lithography, Ridge-Grating Distributed-Feedback Lasers Fabricated by X-ray Lithography, Fabrication of Sub-micron MSM Photodiodes by X-ray Lithography, Submicrometer-Period Transmission Gratings for X-ray Spectroscopy, Submicrometer-Period Transmission Gratings for X-ray Interferometry, Submicrometer-Period Transmission Gratings for Atom-Beam Spectroscopy, Submicrometer-Period Transmission Gratings for Atom-Beam Interferometry, High-Dispersion, High Efficiency Transmission Gratings for Astrophysical X-ray Spectroscopy, GaAs Epitaxy on Sawtooth-Patterned Silicon
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