Nanostructures Technology, Research, and Applications
Citable URI:
http://hdl.handle.net/1721.1/57290
| Title: | Nanostructures Technology, Research, and Applications |
| Author: | Smith, Henry I.; Silverman, Scott E.; Ferrera, Juan; Wong, Vincent V.; Carter, James M.; Hector, Scott D.; Moon, Euclid E.; Owen, Gabrielle M.; Schattenburg, Mark L.; Yang, Isabel Y.; Burkhardt, Martin; Li, Huiying; Mondol, Mark K.; Murphy, Edward; Everett, Patrick N.; Fleming, Robert C., Jr.; Savas, Timothy A.; Shah, Satyen N.; Yasaka, Anto; Jackson, Keith M.; Antoniadis, Dimitri A.; Gupta, Nitin; Melloch, Michael R.; Hugunin, James J.; Fonstad, Clifton G., Jr.; Damask, Jay N.; Aucoin, Richard J.; Canizares, Claude R.; Porter, Jeanne M.; Donovan, Sean M.; Ismail, Khalid; Kolodziejski, Leslie A.; Thompson, Carl V. |
| Publisher: | Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT) |
| Issue Date: | 1994-01-01 |
| Description: | Contains reports on seventeen research projects and a list of publications. |
| URI: | http://hdl.handle.net/1721.1/57290 |
| Other Identifiers: | RLE_PR_137_01_02s_05 |
| Is Part Of | Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1994 Solid State Physics, Electronics and Optics Quantum-Effect Devices Nanostructures Technology, Research, and Applications |
| Series/Report no.: | Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 137 |
| Keywords: | Nanostructures Technology, Nanostructures Research, Nanostructures Applications, NanoStructures Laboratory, Scanning Electron Beam Lithography, Spatial-Phase-Locked Electron-Beam Lithography, X-Ray Nanolithography, Improved Mask Technology for X-Ray Lithography, High-Precision Mask Alignment System, Interferometric Lithography, Ion-Beam Lithography, High-Performance Self-aligned Sub-100 nm MOSFETs Using X-ray Lithography, Fabrication of T-gate Devices using X-ray Lithography, Coulomb Charging Effects in Semiconductor Nanostructures, Coulomb Charging Tunneling in Semiconductor Nanostructures, Superconductor/Semiconductor Interface of V₃Si, Superconductor/Semiconductor Interface of Si, Laterally-Coupled Distributed-Feedback Lasers Fabricated by X-Ray Lithography, Combined Spatial-Phase-Locked Electron-Beam for Channel-Dropping Filters, Combined Spatial-Phase-Locked X-ray for Channel-Dropping Filters, Combined Spatial-Phase-Locked Optical Lithography for Channel-Dropping Filters, High-Dispersion, High-Efficiency Transmission Gratings for Astrophysical X-ray Spectroscopy, Submicrometer-Period Transmission Gratings for X-ray Spectroscopy, Submicrometer-Period Transmission Gratings for X-ray Interferometry, Submicrometer-Period Transmission Gratings for Atom-Beam Spectroscopy, Submicrometer-Period Transmission Gratings for Atom-Beam Interferometry, GaAs Epitaxy on Sawtooth-Patterned Silicon |
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| RLE_PR_137_01_02s_05.pdf | 22.29Mb |
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