A novel sublimable mask lift-off method for patterning thin films

Abstract

Photolithography's accuracy and scalability has made it the method for sub-micron-scale definition of single-crystal semiconductor devices for over half a century. Unfortunately, organic semiconductor devices are chemically incompatible with the types of resists, solvents, and etchants traditionally used. This work investigates the use of a chemically inert resist that relies on phase changes for lift-off patterning thin films of organic semiconductors and metals.