Scanning electron-beam lithography (SEBL) provides sub-10-nm resolution and arbitrary-pattern generation; however, SEBL's pattern-placement accuracy remains inadequate for future integrated-circuits and integrated-optical ...

As modem transistors continue to scale down in size, conventional Si CMOS is reaching its physical limits and alternative technologies are needed to extend Moore's law. Among different candidates, MOSFETs with a III-V ...

Microdevice fabrication is done on the surface of polished flat semiconductor substrates with a series of material depositions, etches and lithography steps. These processes are inherently planar and well suited for the ...

This work addresses the fundamental problem of how a robot acquires local knowledge about its environment. The domain that we are concerned with is a speech-commandable robotic wheelchair operating in a home/special care ...

Over the last decade, an immense amount of data has become available. From collections of photos, to genetic data, and to network traffic statistics, modern technologies and cheap storage have made it possible to accumulate ...