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Comparison of two ICCS conductors for MHD applications

dc.contributor.authorHale, J.R.en_US
dc.contributor.authorMarston, P.G.en_US
dc.contributor.authorDawson, A.M.en_US
dc.date.accessioned2015-02-19T19:29:27Z
dc.date.available2015-02-19T19:29:27Z
dc.date.issued1988-01-01en_US
dc.identifier88ja032en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/95001
dc.publisherMIT Plasma Science and Fusion Centeren_US
dc.titleComparison of two ICCS conductors for MHD applicationsen_US


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