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DC magnetron reactive sputtering of low stress AlN piezoelectric thin films for MEMS application

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DC magnetron reactive sputtering of low stress AlN piezoelectric thin films for MEMS application

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Alternative Title: Direct current magnetron reactive sputtering of low stress aluminum nitride piezoelectric thin films for microelectromechanical systems application
Author: Hsieh, Peter Y. (Peter Yaw-ming), 1975-
Department: Massachusetts Institute of Technology. Dept. of Materials Science and Engineering
Publisher: Massachusetts Institute of Technology
Date Issued: 1999
Description:
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1999.Includes bibliographical references (p. 59-60).
URI: http://hdl.handle.net/1721.1/9736
Keywords: Materials Science and Engineering

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