Simulation and analysis of rarefied gas flows in chemical vapor deposition processes

Coronell, Daniel G

Simulation and analysis of rarefied gas flows in chemical vapor deposition processes

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29948814-MIT.pdf

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Author(s)

Coronell, Daniel G

Advisor(s)

Klavis F. Jensen.

Date Issued

1993

Publisher

Massachusetts Institute of Technology

Description

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1993.

Includes bibliographical references (leaves 288-300).

Subjects

Chemical Engineering

MIT Department

Massachusetts Institute of Technology. Department of Chemical Engineering

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http://hdl.handle.net/1721.1/12493