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  5. Simulation and analysis of rarefied gas flows in chemical vapor deposition processes

Simulation and analysis of rarefied gas flows in chemical vapor deposition processes

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Author(s)
Coronell, Daniel G
Advisor(s)
Klavis F. Jensen.
Date Issued
1993
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1993.
Includes bibliographical references (leaves 288-300).
Subjects
Chemical Engineering
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
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M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Persistent DSpace Link
http://hdl.handle.net/1721.1/12493
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