Design of a liquid embossing machine
Name
49013668-MIT.pdf
Description
Full printable version
Size
22.71 MB
Format
Adobe PDF
Checksum (MD5)
d7c2c548c0c1393246179ed75bf3ad09
Author(s)
Wilhelm, Eric Jamesson, 1977-
Advisor(s)
Joseph M. Jacobson.
Alternative Title
Liquid embossing machine
Date Issued
2001
Publisher
Massachusetts Institute of Technology
Abstract
A machine was designed to pattern thin films of liquid by liquid embossing. 10 designs were prototyped and evaluated according to pattern transfer, alignment, and ability to emboss large area. The final design utilizes a PDMS stamp cast such that it seals an air cavity, which is then pressurized to slightly bow the stamp. The cavity is clear so alignment can be accomplished by optical feedback using a camera and microscope objective. The theory of liquid embossing is discussed. PDMS has a very high contact angle with most fluids and so it is able to clear liquid from channels approximately 5 [mu]m wide. The wettability of the substrate is modified after being in contact with PDMS so the liquid does not reflow into the channels. Sub-micron alignment between layers was achieved. Vector plots of runout between layers are given. Electrical yield was found to be 89% and was not negatively correlated by stamp age up to 1000 dry stamps. The stamps were found to wear, but due to their conformal nature this did not affect pattern transfer. Structures created by the liquid embossing machine include electrostatic actuators, test patterns with 100 nm features, vias, under-etched metal layers, and released cantilevers.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2001.
Includes bibliographical references (leaves 97-98).
Subjects
Mechanical Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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