A fundamental study of feature evolution during high density plasma etching
Name
48206466-MIT.pdf
Description
Full printable version
Size
19.35 MB
Format
Adobe PDF
Checksum (MD5)
72c4b013f3ce186cab6937fe85804690
Author(s)
Lane, Jennifer M. (Jennifer Marie), 1977-
Advisor(s)
Herbert H. Swain.
Alternative Title
Feature evolution during high density plasma etching
Date Issued
1999
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.Eng. and S.B.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1999.
Includes bibliographical references (leaves 91-94).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission.
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