Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation
Name
2016 MOCN accepted manuscript.pdf
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377.31 KB
Format
Adobe PDF
Checksum (MD5)
56f197609327474ff82f107bf793c170
Author(s)
Perrotta, Alberto
Heinze, Katja
Creatore, Mariadriana
Boscher, Nicolas
Wang, Minghui
Gleason, Karen K
Date Issued
September 2016
Journal
Advanced Materials
Publisher
Wiley Blackwell
Citation
Boscher, Nicolas D. et al. “Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation.” Advanced Materials 28.34 (2016): 7479–7485.
Version
Author's final manuscript
Abstract
The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
Terms of Use
Creative Commons Attribution-Noncommercial-Share Alike
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DOI of Published Version
https://doi.org/10.1002/adma.201601010
