Invited Article: Precision nanoimplantation of nitrogen vacancy centers into diamond photonic crystal cavities and waveguides
Name
1.4948746.pdf
Description
Published version
Size
5.48 MB
Format
Unknown
Checksum (MD5)
2736a8e5f4af6c1fcf37b76b6aff1da1
Author(s)
Schukraft, M.
Zheng, J.
Schröder, T.
Mouradian, S. L.
Walsh, M.
Trusheim, M. E.
Bakhru, H.
Englund, D. R.
Date Issued
May 2016
Journal
APL Photonics
Publisher
AIP Publishing
Version
Final published version
Abstract
© 2016 Author(s). We demonstrate a self-aligned lithographic technique for precision generation of nitrogen vacancy (NV) centers within photonic nanostructures on bulk diamond substrates. The process relies on a lithographic mask with nanoscale implantation apertures for NV creation, together with larger features for producing waveguides and photonic nanocavities. This mask allows targeted nitrogen ion implantation, and precision dry etching of nanostructures on bulk diamond. We demonstrate high-yield generation of single NVs at pre-determined nanoscale target regions on suspended diamond waveguides. We report implantation into the mode maximum of diamond photonic crystal nanocavities with a single-NV per cavity yield of ∼26% and Purcell induced intensity enhancement of the zero-phonon line. The generation of NV centers aligned with diamond photonic structures marks an important tool for scalable production of optically coupled spin memories.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
Creative Commons Attribution 4.0 International license
Persistent DSpace Link
DOI of Published Version
http://dx.doi.org/10.1063/1.4948746
