Three-dimensional nanofabrication by electron-beam lithography and directed self-assembly
Name
900731899-MIT.pdf
Description
Full printable version
Size
1.46 MB
Format
Adobe PDF
Checksum (MD5)
920256dfe7cbb0e96866796cc0834243
Author(s)
Do, Hyung Wan
Advisor(s)
Karl K. Berggren.
Date Issued
2014
Publisher
Massachusetts Institute of Technology
Abstract
In this thesis, we investigated three-dimensional (3D) nanofabrication using electron-beam lithography (EBL), block copolymer (BCP) self-assembly, and capillary force-induced self-assembly. We first developed new processes for fabricating 3D nanostructures using a hydrogen silsesquioxane (HSQ) and poly(methylmeth-acrylate) (PMMA) bilayer resist stack. We demonstrated self-aligned mushroom-shaped posts and freestanding supported structures. Next, we used the 3D nanostructures as topographical templates guiding the self-assembly of polystyrene-b-polydimethylsiloxane (PS-b-PDMS) block copolymer thin films. We observed parallel cylinders, mesh-shaped structures, and bar-shaped structures in PDMS. Finally, we studied capillary force-induced self-assembly of linear nanostructures using a spin drying process. We developed a computation schema based on the pairwise collapse of nanostructures. We achieved propagation of information and built a proof of concept logic gate.
Description
Thesis: S.M., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2014.
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references.
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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