10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process
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Author(s)
Huang, I-Chun
Holzgrafe, Jeffrey
Choy, Jennifer T.
Lončar, Marko
Jensen, Russell Andrew
Bawendi, Moungi G
Date Issued
September 2016
Journal
Applied Physics Letters
Publisher
American Institute of Physics (AIP)
Citation
Huang, I. Chun, et al. “10 Nm Gap Bowtie Plasmonic Apertures Fabricated by Modified Lift-off Process.” Applied Physics Letters, vol. 109, no. 13, Sept. 2016, p. 133105. © 2016 AIP Publishing LLC
Version
Final published version
Abstract
Bowtie plasmonic apertures, with gap sizes down to 11 nm and silver film thickness of up to 150 nm (aspect ratio 14:1), were fabricated on a silicon nitride membrane. Transmission spectra feature the aperture resonances ranging from 470 to 687 nm, with quality factors around 10. The mode area of the smallest gap aperture is estimated to be as small as 0.002 (k/n)[superscript 2] using numerical modeling. Importantly, our fabrication technique, based on an e-beam lithography and a lift-off process, is scalable which allows fabrication of many devices in parallel over a relatively large
area. We believe that the devices demonstrated in this work will find application in studying and engineering light-matter interactions.
MIT Department
Massachusetts Institute of Technology. Department of Chemistry
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1063/1.4963689
