Bilayer graphene growth by low pressure chemical vapor deposition on copper foil
Name
818359166-MIT.pdf
Description
Full printable version
Size
7.59 MB
Format
Adobe PDF
Checksum (MD5)
13416b3457210141ded78b546ae0d6dd
Author(s)
Fang, Wenjing, Ph. D. Massachusetts Institute of Technology
Advisor(s)
Jing Kong.
Alternative Title
Bilayer graphene growth by LPCVD on copper foil
Bilayer graphene growth using coronene
Date Issued
2012
Publisher
Massachusetts Institute of Technology
Abstract
Successfully integrating graphene in standard processes for applications in electronics relies on the synthesis of high-quality films. In this work we study Low Pressure Chemical Vapor Deposition (LPCVD) growth of bilayer graphene on the outside surface of copper enclosures. The effect of several parameters on bilayer growth rate and domain size was investigated and high-coverage bilayers films were successfully grown. Furthermore, the quality of the bilayer was confirmed using Raman spectroscopy. Finally, we consider future studies that may reveal the underlying mechanisms behind bilayer growth.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 49-51).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission.
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission.
Persistent DSpace Link
