Precision six degrees of freedom magnetically-levitated photolithography stage

Williams, Mark E. (Mark Edd)

Precision six degrees of freedom magnetically-levitated photolithography stage

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Author(s)

Williams, Mark E. (Mark Edd)

Advisor(s)

David L. Trumper.

Date Issued

1998

Publisher

Massachusetts Institute of Technology

Description

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1998.

Includes bibliographical references (leaves 221-225).

Subjects

Mechanical Engineering

MIT Department

Massachusetts Institute of Technology. Department of Mechanical Engineering

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http://dspace.mit.edu/handle/1721.1/7582

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http://hdl.handle.net/1721.1/9850