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  5. Precision six degrees of freedom magnetically-levitated photolithography stage

Precision six degrees of freedom magnetically-levitated photolithography stage

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Author(s)
Williams, Mark E. (Mark Edd)
Advisor(s)
David L. Trumper.
Date Issued
1998
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1998.
Includes bibliographical references (leaves 221-225).
Subjects
Mechanical Engineering
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
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http://hdl.handle.net/1721.1/9850
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