The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates
Name
41881583-MIT.pdf
Description
Full printable version
Size
5.12 MB
Format
Adobe PDF
Checksum (MD5)
ce4200f7881efbce2793a28953cd3d82
Author(s)
Stefanik, Todd Stanley, 1973-
Advisor(s)
Michael J. Cima.
Date Issued
1996
Publisher
Massachusetts Institute of Technology
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.
Includes bibliographical references (leaves 108-110).
Subjects
Materials Science and Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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