Quantifying aluminum and semiconductor industry perfluorocarbon emissions from atmospheric measurements
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Prinn_Quantifying aluminum.pdf
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Author(s)
Kim, Jooil
Fraser, Paul J.
Li, Shanlan
Ganesan, Anita L.
Krummel, P. B.
Steele, L. Paul
Park, Sunyoung
Kim, Seung-Kyu
Park, Mi-Kyung
Arnold, Tim
Date Issued
July 2014
Journal
Geophysical Research Letters
Publisher
Wiley Blackwell
Citation
Kim, Jooil, Paul J. Fraser, Shanlan Li, Jens Mühle, Anita L. Ganesan, Paul B. Krummel, L. Paul Steele, et al. “Quantifying Aluminum and Semiconductor Industry Perfluorocarbon Emissions from Atmospheric Measurements.” Geophysical Research Letters (July 2014): n/a–n/a. © 2014 American Geophysical Union
Version
Final published version
Abstract
The potent anthropogenic perfluorocarbon greenhouse gases tetrafluoromethane (CF[subscript 4]) and hexafluoroethane (C[subscript 2]F[subscript 6]) are emitted to the atmosphere mainly by the aluminum and semiconductor industries. Global emissions of these perfluorocarbons (PFCs) calculated from atmospheric measurements are significantly greater than expected from reported national and industry-based emission inventories. In this study, in situ measurements of the two PFCs in the Advanced Global Atmospheric Gases Experiment network are used to show that their emission ratio varies according to the relative regional presence of these two industries, providing an industry-specific emission “signature” to apportion the observed emissions. Our results suggest that underestimated emissions from the global semiconductor industry during 1990–2010, as well as from China's aluminum industry after 2002, account for the observed differences between emissions based on atmospheric measurements and on inventories. These differences are significant despite the large uncertainties in emissions based on the methodologies used by these industries.
MIT Department
Massachusetts Institute of Technology. Center for Global Change Science
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1002/2014GL059783
