Post oxide etching cleaning process using integrated ashing and HF vapor process
Name
43933953-MIT.pdf
Description
Full printable version
Size
3.68 MB
Format
Adobe PDF
Checksum (MD5)
02fd09627081be0784f141687b91356b
Author(s)
Kwon, Ohseung, 1969-
Advisor(s)
Herbert H. Swain.
Date Issued
1999
Publisher
Massachusetts Institute of Technology
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1999.
Includes bibliographical references (leaves 50-51).
Subjects
Materials Science and Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
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