Ultrathin high-resolution flexographic printing using nanoporous stamps
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Gleason_Ultrathin high.pdf
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Author(s) • • • • • •
Kim, Sanha
Sojoudi, Hossein
Zhao, Hangbo
Mariappan, Dhanushkodi Durai
McKinley, Gareth H
Gleason, Karen K
Hart, Anastasios John
Date Issued
November 2016
Journal
Science Advances
Publisher
American Association for the Advancement of Science (AAAS)
Citation
Kim, S. et al. “Ultrathin High-Resolution Flexographic Printing Using Nanoporous Stamps.” Science Advances 2.12 (2016): e1601660–e1601660.
Version
Final published version
Abstract
Since its invention in ancient times, relief printing, commonly called flexography, has been used to mass-produce artifacts ranging from decorative graphics to printed media. Now, higher-resolution flexography is essential to manufacturing low-cost, large-area printed electronics. However, because of contact-mediated liquid instabilities and spreading, the resolution of flexographic printing using elastomeric stamps is limited to tens of micrometers. We introduce engineered nanoporous microstructures, comprising polymer-coated aligned carbon nanotubes (CNTs), as a next-generation stamp material. We design and engineer the highly porous microstructures to be wetted by colloidal inks and to transfer a thin layer to a target substrate upon brief contact. We demonstrate printing of diverse micrometer-scale patterns of a variety of functional nanoparticle inks, including Ag, ZnO, WO[subscript 3], and CdSe/ZnS, onto both rigid and compliant substrates. The printed patterns have highly uniform nanoscale thickness (5 to 50 nm) and match the stamp features with high fidelity (edge roughness, ~0.2 μm). We derive conditions for uniform printing based on nanoscale contact mechanics, characterize printed Ag lines and transparent conductors, and achieve continuous printing at a speed of 0.2 m/s. The latter represents a combination of resolution and throughput that far surpasses industrial printing technologies.
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
Massachusetts Institute of Technology. Department of Mechanical Engineering
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Creative Commons Attribution-NonCommercial 4.0 International
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DOI of Published Version
https://doi.org/10.1126/sciadv.1601660