Fabrication of Highly Ordered Nanoparticle Arrays Using Thin Porous Alumina Masks
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AMMNS009.pdf
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Author(s)
Lei, Y.
Teo, L.W.
Yeong, K.S.
See, Y.H.
Chim, Wai Kin
Choi, Wee Kiong
Thong, J.T.L.
Date Issued
January 2003
Series/Report no.
Advanced Materials for Micro- and Nano-Systems (AMMNS);
Abstract
Highly ordered nanoparticle arrays have been successfully fabricated by our group recently using ultra-thin porous alumina membranes as masks in the evaporation process. The sizes of the nanoparticles can be adjusted from 5-10 nm to 200 nm while the spacing between adjacent particles can also be adjusted from several nanometers to about twice the size of a nanoparticle. The configuration of the nanoparticles can be adjusted by changing the height of the alumina masks and the evaporation direction. Due to the high pore regularity and good controllability of the particle size and spacing, this method is useful for the ordered growth of nanocrystals. Different kinds of nanoparticle arrays have been prepared on silicon wafer including semiconductors (e.g., germanium) and metals (e.g., nickel). The germanium nanoparticle arrays have potential applications in memory devices while the nickel catalyst nanoparticle arrays can be used for the growth of ordered carbon nanotubes.
Subjects
porous alumina
nanoparticle arrays
nanofabrication
germanium
nickel
carbon nanotubes
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