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  5. Simulation of the effect of microstructure on electromigration induced failure of interconnects

Simulation of the effect of microstructure on electromigration induced failure of interconnects

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Author(s)
Fayad, Walid R. (Walid Rahif)
Advisor(s)
Carl V. Thompson.
Date Issued
1997
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Civil and Environmental Engineering, 1997.
Includes bibliographical references (leaves 85-87).
Subjects
Civil and Environmental Engineering
MIT Department
Massachusetts Institute of Technology. Department of Civil and Environmental Engineering
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http://dspace.mit.edu/handle/1721.1/7582
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http://hdl.handle.net/1721.1/45477
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