The origins of pressure-induced phase transformations during the surface texturing of silicon using femtosecond laser irradiation
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Gradecak_Origins of pressure.pdf
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Author(s) • • • • •
Smith, Matthew J.
Sher, Meng-Ju
Franta, Benjamin
Lin, Yu-Ting
Mazur, Eric
Gradecak, Silvija
Date Issued
October 2012
Journal
Journal of Applied Physics
Publisher
American Institute of Physics (AIP)
Citation
Smith, Matthew J., Meng-Ju Sher, Benjamin Franta, Yu-Ting Lin, Eric Mazur, and Silvija Gradečak. “The origins of pressure-induced phase transformations during the surface texturing of silicon using femtosecond laser irradiation.” Journal of Applied Physics 112, no. 8 (2012): 083518. © 2012 American Institute of Physics
Version
Final published version
Abstract
Surface texturing of silicon using femtosecond (fs) laser irradiation is an attractive method for enhancing light trapping, but the laser-induced damage that occurs in parallel with surface texturing can inhibit device performance. In this work, we investigate the light-material interaction during the texturing of silicon by directly correlating the formation of pressure-induced silicon polymorphs, fs-laser irradiation conditions, and the resulting morphology and microstructure using scanning electron microscopy, micro-Raman spectroscopy, and transmission electron microscopy. We show that raster scanning a pulsed laser beam with a Gaussian profile enhances the formation of crystalline pressure-induced silicon polymorphs by an order of magnitude compared with stationary pulsed fs-laser irradiation. Based on these observations, we identify resolidification-induced stresses as the mechanism responsible for driving sub-surface phase transformations during the surface texturing of silicon, the understanding of which is an important first step towards reducing laser-induced damage during the texturing of silicon with fs-laser irradiation.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1063/1.4759140