Characterization of optical interconnects
Name
48040192-MIT.pdf
Description
Full printable version
Size
3.64 MB
Format
Adobe PDF
Checksum (MD5)
148fefe8410ceb134ae92edcba011480
Author(s)
Sam, Shiou Lin, 1976-
Advisor(s)
Duane Boning and Anantha Chandrakasan.
Date Issued
2000
Publisher
Massachusetts Institute of Technology
Abstract
Interconnect has become a major issue in deep sub-micron technology. Even with copper and low-k dielectrics, parasitic effects of interconnects will eventually impede advances in integrated electronics. One technique that has the potential to provide a paradigm shift is optics. This project evaluates the feasibility of optical interconnects for distributing data and clock signals. In adopting this scheme, variation is introduced by the detector, the waveguides, and the optoelectronic circuit, which includes device, power supply and temperature variations. We attempt to characterize the effects of the aforementioned sources of variation by designing a baseline optoelectronic circuitry and fabricating a test chip which consists of the circuitry and detectors. Simulations are also performed to supplement the effort. The results are compared with the performance of traditional metal interconnects. The feasibility of optical interconnects is found to be sensitive to the optoelectronic circuitry used. Variation effects from the devices and operating conditions have profound impact on the performance of optical interconnects since they introduce substantial skew and delay in the otherwise ideal system.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000.
Includes bibliographical references (p. 72-75).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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