A novel sublimable mask lift-off method for patterning thin films
Name
746081955-MIT.pdf
Description
Full printable version
Size
2.97 MB
Format
Adobe PDF
Checksum (MD5)
5a6654b5661e05a0317dd9d5935dc611
Author(s)
Bahlke, Matthias Erhard
Advisor(s)
Marc A. Baldo.
Date Issued
2011
Publisher
Massachusetts Institute of Technology
Abstract
Photolithography's accuracy and scalability has made it the method for sub-micron-scale definition of single-crystal semiconductor devices for over half a century. Unfortunately, organic semiconductor devices are chemically incompatible with the types of resists, solvents, and etchants traditionally used. This work investigates the use of a chemically inert resist that relies on phase changes for lift-off patterning thin films of organic semiconductors and metals.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 39-42).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission.
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