Synchrotron-based analysis of chromium distributions in multicrystalline silicon for solar cells
Name
20150410-Jensen-APL.pdf
Size
513.77 KB
Format
Adobe PDF
Checksum (MD5)
ac51aede2da8da07f0c51e98c4c8c996
Author(s) • • • • • •
Coletti, Gianluca
Lai, Barry
Jensen, Mallory Ann
Hofstetter, Jasmin
Morishige, Ashley Elizabeth
Fenning, David P
Buonassisi, Anthony
Date Issued
May 2015
Journal
Applied Physics Letters
Publisher
American Institute of Physics (AIP)
Citation
Jensen, Mallory Ann et al. “Synchrotron-Based Analysis of Chromium Distributions in Multicrystalline Silicon for Solar Cells.” Applied Physics Letters 106, 20 (May 2015): 202104 © 2015 AIP Publishing LLC
Version
Author's final manuscript
Abstract
Chromium (Cr) can degrade silicon wafer-based solar cell efficiencies at concentrations as low as 10¹⁰cm⁻³. In this contribution, we employ synchrotron-based X-ray fluorescence microscopy to study chromium distributions in multicrystalline silicon in as-grown material and after phosphorous diffusion. We complement quantified precipitate size and spatial distribution with interstitial Cr concentration and minority carrier lifetime measurements to provide insight into chromium gettering kinetics and offer suggestions for minimizing the device impacts of chromium. We observe that Cr-rich precipitates in as-grown material are generally smaller than iron-rich precipitates and that Cr[subscript i] point defects account for only one-half of the total Cr in the as-grown material. This observation is consistent with previous hypotheses that Cr transport and CrSi₂ growth are more strongly diffusion-limited during ingot cooling. We apply two phosphorous diffusion gettering profiles that both increase minority carrier lifetime by two orders of magnitude and reduce [Cr[subscript i]] by three orders of magnitude to 10¹⁰cm⁻³. Some Cr-rich precipitates persist after both processes, and locally high [Cr[subscript i]] after the high-temperature process indicates that further optimization of the chromium gettering profile is possible.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
Terms of Use
Creative Commons Attribution-Noncommercial-Share Alike
Persistent DSpace Link
DOI of Published Version
https://doi.org/10.1063/1.4921619