Hyperthermal molecular beam dry etching of III-V compound semiconductors
Name
37525736-MIT.pdf
Description
Full printable version
Size
46.78 MB
Format
Adobe PDF
Checksum (MD5)
e8587a72765391d7459bcb10c9fcd239
Author(s)
Hoshino, Isako.
Advisor(s)
Clifton G. Fonstad, Jr.
Date Issued
1997
Publisher
Massachusetts Institute of Technology
Description
Includes bibliographical references (p. 181-186).
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997.
Vita.
Subjects
Materials Science and Engineering
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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