Non‐perturbative cathodoluminescence microscopy of beam‐sensitive materials
Name
Nanophotonics - 2025 - Bogroff - Non‐perturbative cathodoluminescence microscopy of beam‐sensitive materials (1).pdf
Description
Published version
Size
2.12 MB
Format
Adobe PDF
Checksum (MD5)
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Author(s)
Bogroff, Malcolm
Cowley, Gabriel
Nicastro, Ariel
Levy, David
Wu, Yueh‐Chun
Mao, Nannan
Yang, Tilo H
Zhang, Tianyi
Kong, Jing
Vasudevan, Rama
Date Issued
March 6, 2025
Journal
Nanophotonics
Publisher
Wiley
Citation
Bogroff, M., Cowley, G., Nicastro, A., Levy, D., Wu, Y.-C., Mao, N., Yang, T.H., Zhang, T., Kong, J., Vasudevan, R., Kelley, K.P. and Lawrie, B.J. (2025), Non-perturbative cathodoluminescence microscopy of beam-sensitive materials. Nanophotonics, 14: 2095-2101.
Version
Final published version
Abstract
Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
Creative Commons Attribution
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DOI of Published Version
https://doi.org/10.1515/nanoph-2024-0724
