PAG segregation during exposure affecting innate material roughness
Name
Fedynyshyn-2009-PAG segregation during exposure affecting innate material roughness.pdf
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183.03 KB
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Author(s)
Pottebaum, Indira
Cann, Susan G.
Cabral, Alberto
Astolfi, David K.
Fedynyshyn, Theodore H.
Roberts, Jeanette M.
Date Issued
April 2009
Journal
Proceedings of SPIE
Publisher
The International Society for Optical Engineering
Citation
Fedynyshyn, Theodore H. et al. “PAG segregation during exposure affecting innate material roughness.” Advances in Resist Materials and Processing Technology XXVI. Ed. Clifford L. Henderson. San Jose, CA, USA: SPIE, 2009. 727349-11. © 2009 SPIE--The International Society for Optical Engineering
Version
Final published version
Abstract
We have developed an improved AFM-based technique to measure intrinsic material roughness (IMR) after base development. We have investigated the contribution of different polymeric PAGs to IMR. These polymeric PAGs include copolymers of several styrenic PAGs with hydroxystyrene. The IMR of these polymer-bound PAGs is reduced relative to that of their nonpolymeric counterparts with DUV exposure. Theses results represent further evidence for PAG segregation during the bake steps as being responsible for increased IMR in exposed resists, presumably by increasing the dissolution rate inhomogeneity on a nano-scale level. The work also shows that the effects of PAG segregation can be mitigated by employing polymer-bound PAGs. 2
MIT Department
Lincoln Laboratory
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DOI of Published Version
http://dx.doi.org/10.1117/12.814811
