Grayscale stencil lithography for patterning multispectral color filters
Name
optica-7-9-1154.pdf
Description
Published version
Size
2.65 MB
Format
Unknown
Checksum (MD5)
e8a5a25c6369ae095e4ec21c062204f3
Author(s)
Li, Xinhao
Tan, Zheng Jie
Fang, Nicholas X
Date Issued
2020
Journal
Optica
Publisher
The Optical Society
Citation
Li, Xinhao, Tan, Zheng Jie and Fang, Nicholas X. 2020. "Grayscale stencil lithography for patterning multispectral color filters." Optica, 7 (9).
Version
Final published version
Abstract
© 2020 Optical Society of America Flat optics for spatially resolved amplitude and phase modulation usually rely on 2D patterning of layered structures with spatial thickness variation. For example, Fabry–Perot-type multilayer structures have been applied widely as spectral filter arrays. However, it is challenging to efficiently fabricate large-scale multilayer structures with spatially variable thicknesses. Conventional photo/eBeam-lithography-based approaches suffer from either low-efficiency and high-cost iterative processes or limitations on materials for spectral tunability. In this work, an efficient and cost-effective grayscale stencil lithography method is demonstrated to achieve material deposition with spatial thickness variation. The design of stencil shadow masks and deposition strategy offers arbitrarily 2D thickness patterning with low surface roughness. The method is applied to fabricate multispectral reflective filter arrays based on lossy Fabry–Perot-type optical stacks with dielectric layers of variable thickness, which generate a wide color spectrum with high customizability. Grayscale stencil lithography offers a feasible and efficient solution to overcome the thickness-step and material limitations in fabricating spatially thickness-varying structures. The principles of this method can find applications in micro-fabrication for optical sensing, imaging, and computing.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Persistent DSpace Link
DOI of Published Version
https://doi.org/10.1364/OPTICA.389425
