Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays
Name
Berggren-Aligned Sub-10-Nm.pdf
Size
5.83 MB
Format
Adobe PDF
Checksum (MD5)
2fcf15227eb29e6d705bc96ac1c2a7a9
Author(s)
Chang, Jae-Byum
Son, Jeong Gon
Hannon, Adam F.
Alexander-Katz, Alfredo
Ross, Caroline A.
Berggren, Karl K.
Date Issued
March 2012
Journal
ACS Nano
Publisher
American Chemical Society
Citation
Chang, Jae-Byum, Jeong Gon Son, Adam F. Hannon, Alfredo Alexander-Katz, Caroline A. Ross, and Karl K. Berggren. Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays. ACS Nano 6, no. 3 (March 27, 2012): 2071-2077.
Version
Author's final manuscript
Abstract
Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by varying the spacing and geometry of the posts, and the results were modeled using 3D self-consistent field theory. This work illustrates how arrays of narrow lines with specific in-plane orientation can be produced, and how the post height and diameter affect the self-assembly.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Persistent DSpace Link
DOI of Published Version
https://doi.org/10.1021/nn203767s
