Lithographically directed materials assembly
Name
Kingsborough-2009-Lithographically directed materials assembly.pdf
Size
1.2 MB
Format
Adobe PDF
Checksum (MD5)
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Author(s)
Krohn, Keith E.
Goodman, Russell B.
Kingsborough, Richard P.
Fedynyshyn, Theodore H.
Date Issued
March 2009
Journal
Proceedings of SPIE
Publisher
The International Society for Optical Engineering
Citation
Kingsborough, Richard P. et al. “Lithographically directed materials assembly.” Alternative Lithographic Technologies. Ed. Frank M. Schellenberg & Bruno M. La Fontaine. San Jose, CA, USA: SPIE, 2009. 72712D-10. © 2009 SPIE--The International Society for Optical Engineering
Version
Final published version
Abstract
We have developed a processing method that significantly reduces the number of steps necessary to yield a surface that directs block copolymer assembly. This methodology employs a single resistless lithography step that directly changes the surface energy without requiring subsequent material deposition or plasma etching steps. The lithographically defined difference in surface energies acts as a template to direct diblock polymer self-assembly into low-defect periodic structures. Our newly developed lithographically directed self-assembly technique can produce sub-45 nm half pitch lines employing poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and interference lithography. Once assembled into periodic lines of alternating materials, the PMMA block can be removed and the resulting polystyrene features can be used as an etch mask to transfer periodic lines-and-spaces into a silicon substrate.
MIT Department
Lincoln Laboratory
Terms of Use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
http://dx.doi.org/10.1117/12.814625
